产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Cobalt (Co) Sputtering Target
| 材料类型 | Co Target |
|---|---|
| 元素符号 | Co |
| 原子量 | 3N,3N5 |
| 原子序数 | As request |
| 颜色/外形 | Planar |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Cobalt (Co) Sputtering Target Description:
Purity: 3N 3N5
Cobalt sputtering targets are high-purity metallic targets primarily used in physical vapor deposition processes
such as magnetron sputtering to form cobalt thin films with specific functions on substrates.
**Cobalt Planar Targets:** Traditional flat targets with wide applications.
**Cobalt Rotating Targets:** Tubular structure, offering higher material utilization and suitable for large-area continuous
deposition.
**Application Areas:**
Semiconductors and Integrated Circuits: Used for key structures such as contacts and interconnect layers in
advanced process logic chips and memory chips; a crucial material in high-end manufacturing.
Magnetic Storage:
Electronics and Optoelectronic Devices: Used in the manufacture of optoelectronic devices, sensors, OLEDs,
and various other electronic components.
High-End Alloys and Industry: Used as a key raw material in the smelting of superalloys,
applied in high-end manufacturing fields such as aerospace and energy equipment.
Co-3N5-COA
